LAURELL WS-400B SPIN ETCHER, SPIN COATER, USED

Product Specifications:

• Model Number: WS-400B

• Manufacturer: Laurell Technologies Corporation

• Process Type: Spin etching / spin coating

• Substrate Compatibility: Up to 6-inch wafers (varies by chuck)

• Spin Speed Range: Typically up to 8000 RPM (model dependent)

• Control System: Digital programmable interface with multi-step recipes

• Drive System: Brushless motor with closed-loop feedback

• Chamber Type: Vacuum chuck with sealed process chamber

• Power Supply: Standard lab power (varies by configuration)

• Condition: Used

Key Features:

• High-speed spinning for uniform coatings or etch removal

• Customizable recipes for multi-step spin processes (speed, time, ramp rates)

• Compact bench-top design suitable for lab or cleanroom integration

• Sealed spin bowl for solvent containment and easy cleaning

• Vacuum chuck system provides secure substrate holding during spin cycles

• Proven performance in photolithography, MEMS, and thin-film applications

Applications:

• Photolithography: Spin-coating photoresists onto silicon wafers

• MEMS fabrication: Uniform layer application in microsystems engineering

• Thin film research: Controlled deposition of polymers, oxides, and solutions

• Etching processes: Wet chemical etching for substrate surface preparation

• Lab prototyping: Ideal for R&D environments requiring process repeatability