Trion Technology Phantom Rie Plasma Etch and Orion III Plasma Enhanced Chemical Vapor Deposition, 2020

Phatom LT Rie System – Reactor with 8” bottom electrode – System controller includes Pentium based computer and touchscreen interface – Two mass flow controllers (O2, CF4) Automatic tuning with 13.56 MHz 600 RF generator -Automatic pressure control package (butterfly valve with capacitance manometer for pressure measurement) – 60 com non-corrosive dry pump – Recirculating temperature controller (chiller)

All specifications are assumed to be correct but must be confirmed by the purchasing entity.,Orion III PECVD System – Orion Ill reactor with 200mm -Radially designed high conductance plenum and vacuum -System controler (includes Pentium computer and touchscreen interface) -Four mass flow controllers -Automatic pressure control -300 Watt, 350 kHz solid state power supply -Heated lower electrode (controlled 50-400C) -Emergency Of and AC distribution- – 27 com Rotaty Vane pump with oil filtration, demister and Fumbling oil – Wall mount MFC cabinet with blank slot for future N20 MFC

All specifications are assumed to be correct but must be confirmed by the purchasing entity.